AG Associates is one of the most famous RTP equipment manufacturers – Santa Clara

AG Associates is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R&D centers, Institutes all over the world have been using AG Heatpulse Systems.The following is a list of AG Heatpulse products:

• AG Heatpulse 210
• AG Heatpulse 310
• AG Heatpulse 410
• AG Heatpulse 610
• AG Heatpulse 2100
• AG Heatpulse 4100
• AG Heatpulse 4100S
• AG Heatpulse 4108
• AG Heatpulse 8108

AG Heatpulse Spare Parts

Lease RTA tool

We are the exclusive lincenced manufacture of AG Heatpulse 610.The brand new system is named of AccuThermo AW 610 with our innovative AW control software and more advanced Superior Temperature Control Technology.We are providing the exclusive licensed technical service for all the AG Heatpulse 610 systems all over the world.

AW Control Software provides the unique upgrade system for all AG Heatpulse RTP tools. The advantages of the upgraded systems include:

• Integrated process control system
• Real time graphics display
• Real time process data acquisition, display, and analysis
• Programmed comprehensive calibration and diagnostic functions
• Better performance and maintenance than the original systems

Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal shock..Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.

Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP).

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Address:1550 Norman Ave,Santa Clara,CA95054

sales@ag-rtp.com